Sub-0.5 micron lithography with i-line acid-hardened negative resists

✍ Scribed by M.T. Allen; G.S. Calabrese; T.H. Fedynyshyn; A.A. Lamola; R.D. Small

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 322 KB
• Volume: 17
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(92)90057-x