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New negative tone resists for sub-quarter micron lithography

✍ Scribed by H. Sachdev; R. Kwong; W. Huang; A. Katnani; K. Sachdev

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 601 KB
Volume: 27
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(94)00131-d

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