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Bi-layer resist process for sub-micron optical lithography using silicon containing resist

✍ Scribed by B. Martin

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 290 KB
Volume: 17
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(92)90060-5

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