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Nanostructuring of silicon by electron-beam lithography of self-assembled hydroxybiphenyl monolayers

✍ Scribed by Küller, A.; Eck, W.; Stadler, V.; Geyer, W.; Gölzhäuser, A.

Book ID: 121671019
Publisher: American Institute of Physics
Year: 2003
Tongue: English
Weight: 526 KB
Volume: 82
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.1578537

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