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Chemical modification and patterning of self assembled monolayers using scanning electron and ion-beam lithography

✍ Scribed by Maria Jesús Pérez Roldán; César Pascual García; Gerardo Marchesini; Douglas Gilliland; Giacomo Ceccone; Dora Mehn; Pascal Colpo; François Rossi


Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
543 KB
Volume
88
Category
Article
ISSN
0167-9317

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✦ Synopsis


We present chemical modification of self assembled monolayers (SAMs) using electron and ion-beam lithographies. We used thiolated polyethylene oxide (PEO) SAMs on gold to fabricate chemically contrasting patterns at the nanoscale. Patterned surfaces were characterized by X-ray photoelectron spectroscopy (XPS), time of flight-secondary ion mass spectrometry (ToF-SIMS). Results showed a chemical modification of surfaces patterned by means of electron beam (e-beam) lithography and a removal of PEO SAMs on the areas treated with the ion beam. The chemical modification of PEO SAMs converted the nonfouling surfaces on fouling surfaces.


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