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Electron-Beam Chemical Lithography with Aliphatic Self-Assembled Monolayers

✍ Scribed by Nirmalya Ballav; Soeren Schilp; Michael Zharnikov


Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
504 KB
Volume
47
Category
Article
ISSN
0044-8249

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Electron-beam exposure of self-assembled
✍ M.N. Kozicki; S.-J. Yang; B.W. Axelrod πŸ“‚ Article πŸ“… 2000 πŸ› Elsevier Science 🌐 English βš– 93 KB

Tapping mode atomic force microscopy and capacitance versus voltage measurements were employed to study the effects of electron-beam exposure on self-assembled monolayers of 10-undecenoic acid. It was established that exposure increases chemical/mechanical stability, resulting in a thicker layer fol