✦ LIBER ✦
Self-assembled monolayer resists and nanoscale lithography of silicon dioxide thin films by chemically enhanced vapor etching (CEVE)
✍ Scribed by M. Pan; M. Yun; M.N. Kozicki; T.K. Whidden
- Publisher
- Elsevier Science
- Year
- 1996
- Tongue
- English
- Weight
- 194 KB
- Volume
- 20
- Category
- Article
- ISSN
- 0749-6036
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