Electron-beam exposure of self-assembled monolayers of 10-undecenoic acid

✍ Scribed by M.N. Kozicki; S.-J. Yang; B.W. Axelrod

• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 93 KB
• Volume: 27
• Category: Article
• ISSN: 0749-6036
• DOI: 10.1006/spmi.2000.0826

✦ Synopsis

Tapping mode atomic force microscopy and capacitance versus voltage measurements were employed to study the effects of electron-beam exposure on self-assembled monolayers of 10-undecenoic acid. It was established that exposure increases chemical/mechanical stability, resulting in a thicker layer following a solvent treatment designed to remove residual monomers. Electron exposure also reduces the effects of pinholes in the monolayer, thereby improving dielectric quality.