𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Nanoscale patterning of self-assembled monolayers by e-beam lithography

✍ Scribed by Thomas Weimann; Wolfgang Geyer; Peter Hinze; Volker Stadler; Wolfgang Eck; Armin Gölzhäuser

Book ID
114155266
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
319 KB
Volume
57-58
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Chemical modification and patterning of
Chemical modification and patterning of self assembled monolayers using scanning electron and ion-beam lithography
✍ Maria Jesús Pérez Roldán; César Pascual García; Gerardo Marchesini; Douglas Gill 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 543 KB

We present chemical modification of self assembled monolayers (SAMs) using electron and ion-beam lithographies. We used thiolated polyethylene oxide (PEO) SAMs on gold to fabricate chemically contrasting patterns at the nanoscale. Patterned surfaces were characterized by X-ray photoelectron spectros

Laser-scanning lithography (LSL) for the
Laser-scanning lithography (LSL) for the soft lithographic patterning of cell-adhesive self-assembled monolayers
✍ Jordan S. Miller; Mathilde I. Béthencourt; Mariah Hahn; T. Randall Lee; Jennifer 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 364 KB 👁 2 views

## Abstract We report the development of laser‐scanning lithography (LSL), which employs a laser‐scanning confocal microscope to pattern photoresists that can be utilized, for example, in the fabrication of masters for use in soft lithography. This convenient technique provides even exposure across