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Nanoimprint lithography resist profile inversion for lift-off applications

โœ Scribed by Philip A. Shields; Duncan W.E. Allsopp

Book ID
113797822
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
827 KB
Volume
88
Category
Article
ISSN
0167-9317

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A HSQ/PMMA bilayer resist system, in which HSQ as negative tone electron beam resist top layer and PMMA as bottom layer, has been investigated for negative tone lift-off process. Patterns are first defined on the HSQ resist using electron beam lithography, and then transferred into the bottom PMMA l