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Metal lift-off using a trilevel resist system for electron beam lithography

✍ Scribed by J. Etrillard; J. Bellessa; A. Izrael

Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 934 KB
Volume: 7
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(87)90003-7

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