✦ LIBER ✦
Reduction of post exposure delay time and contamination sensitivity in chemically amplified resists: application for lithography using off-line environment
✍ Scribed by L. Pain; B. Scarfogliere; S. Tedesco; C. Gourgon; J.P. Coulomb; M. Morin; M. Ribeiro
- Book ID
- 114155337
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 849 KB
- Volume
- 57-58
- Category
- Article
- ISSN
- 0167-9317
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