๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Nanoimprint Lithography: An Enabling Process for Nanofabrication || || Front_matter

โœ Scribed by Zhou, Weimin

Book ID
120508055
Year
2013
Weight
176 KB
Volume
10.1007/978-3-642-34428-2
Category
Article

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Nanoimprint Lithography: An Enabling Pro
Nanoimprint Lithography: An Enabling Process for Nanofabrication || Nanoimprint Lithography Resists
โœ Zhou, Weimin ๐Ÿ“‚ Article ๐Ÿ“… 2012 ๐Ÿ› Springer Berlin Heidelberg ๐ŸŒ English โš– 513 KB

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro

Nanoimprint Lithography: An Enabling Pro
Nanoimprint Lithography: An Enabling Process for Nanofabrication || Introduction
โœ Zhou, Weimin ๐Ÿ“‚ Article ๐Ÿ“… 2012 ๐Ÿ› Springer Berlin Heidelberg ๐ŸŒ English โš– 79 KB

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro

Nanoimprint Lithography: An Enabling Pro
Nanoimprint Lithography: An Enabling Process for Nanofabrication || Application of NIL in Memory Devices
โœ Zhou, Weimin ๐Ÿ“‚ Article ๐Ÿ“… 2012 ๐Ÿ› Springer Berlin Heidelberg ๐ŸŒ English โš– 844 KB

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro

Lift-off process for nanoimprint lithogr
Lift-off process for nanoimprint lithography
โœ P. Carlberg; M Graczyk; E.-L. Sarwe; I. Maximov; M. Beck; L. Montelius ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 358 KB