๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Nanoimprint Lithography: An Enabling Process for Nanofabrication || Nanoimprint Lithography Resists

โœ Scribed by Zhou, Weimin


Book ID
120508054
Publisher
Springer Berlin Heidelberg
Year
2012
Tongue
English
Weight
513 KB
Edition
2
Category
Article
ISBN
3642344283

No coin nor oath required. For personal study only.

โœฆ Synopsis


Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.


๐Ÿ“œ SIMILAR VOLUMES


Nanoimprint Lithography: An Enabling Pro
โœ Zhou, Weimin ๐Ÿ“‚ Article ๐Ÿ“… 2012 ๐Ÿ› Springer Berlin Heidelberg ๐ŸŒ English โš– 79 KB

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro

Nanoimprint Lithography: An Enabling Pro
โœ Zhou, Weimin ๐Ÿ“‚ Article ๐Ÿ“… 2012 ๐Ÿ› Springer Berlin Heidelberg ๐ŸŒ English โš– 844 KB

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro

Lift-off process for nanoimprint lithogr
โœ P. Carlberg; M Graczyk; E.-L. Sarwe; I. Maximov; M. Beck; L. Montelius ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 358 KB
A photo-polymerization resist for UV nan
โœ Chun-Chang Wu; Steve Lien-Chung Hsu; Wen-Chang Liao ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 740 KB

A novel liquid photo-polymerization resist was prepared for nanoimprint lithography on transparent flexible plastic substrates. The resist is a mixture of polymethylmethacrylate (PMMA), methylmethacrylate (MMA), methacylic acid (MAA) and two photo-initiators, (2-isopropyl thioxanthone (ITX) and ethy