Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro
An assessment of the process capabilities of nanoimprint lithography
β Scribed by Balla, Tobias; Spearing, S Mark; Monk, Andrew
- Book ID
- 120043721
- Publisher
- Institute of Physics
- Year
- 2008
- Tongue
- English
- Weight
- 695 KB
- Volume
- 41
- Category
- Article
- ISSN
- 0022-3727
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Nanoimprint lithography (NIL) has been flagged as one of the most promising processes for next generation lithography due to its simplicity, low cost, high replication fidelity and relatively high throughput. As a key subsystem, the ultra-precision positioning substrate stage plays a particularly cr