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Flow behavior at the embossing stage of nanoimprint lithography

โœ Scribed by Jun-Ho Jeong; Youn-Suk Choi; Young-Jae Shin; Jae-Jong Lee; Kyoung-Taik Park; Eung-Sug Lee; Sang-Rok Lee

Book ID
105644577
Publisher
The Korean Fiber Society
Year
2002
Tongue
English
Weight
306 KB
Volume
3
Category
Article
ISSN
1229-9197

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Nanoimprint lithography (NIL) has been flagged as one of the most promising processes for next generation lithography due to its simplicity, low cost, high replication fidelity and relatively high throughput. As a key subsystem, the ultra-precision positioning substrate stage plays a particularly cr