𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Nanocrystalline γ-Al2O3thin film deposited by magnetron sputtering (MS) at low temperature

✍ Scribed by Adele Carradò; Mohamed A. Taha; Nahed A. El-Mahallawy

Book ID
107562259
Publisher
Springer US
Year
2009
Tongue
English
Weight
373 KB
Volume
7
Category
Article
ISSN
1935-3804

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Epitaxial growth of ZnO thin films on Al
Epitaxial growth of ZnO thin films on AlN substrates deposited at low temperature by magnetron sputtering
✍ Rahmane, S. ;Abdallah, B. ;Soussou, A. ;Gautron, E. ;Jouan, P.-Y. ;Le Brizoual, 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 465 KB

## Abstract Hexagonal aluminium nitride (AlN) and zinc oxide (ZnO) thin films have been deposited by DC and RF reactive magnetron sputtering at room temperature. For a first set of samples, sputtered AlN films were deposited on silicon ZnO substrate. For a second set, ZnO films were deposited on Al

Low-Temperature ALE Deposition of Y2O3 T
Low-Temperature ALE Deposition of Y2O3 Thin Films from β-Diketonate Precursors
✍ M. Putkonen; T. Sajavaara; L.-S. Johansson; L. Niinistö 📂 Article 📅 2001 🏛 John Wiley and Sons 🌐 English ⚖ 461 KB 👁 1 views

Yttrium oxide thin film deposition by atomic layer epitaxy (ALE) was studied at 200±425 C using Y(thd) 3 , Y(thd) 3 (bipyridyl), or Y(thd) 3 (1,10-phenanthroline) (thd = 2,2,6,6-tetramethyl-3,5-heptanedione) as an yttrium precursor, and ozone as an oxygen source. All yttrium precursors were analyzed