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Transparent conductive In2O3:Mo thin films prepared by reactive direct current magnetron sputtering at room temperature

✍ Scribed by Wei-na Miao; Xi-feng Li; Qun Zhang; Li Huang; Zhuang-jian Zhang; Li Zhang; Xue-jian Yan


Book ID
108289214
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
155 KB
Volume
500
Category
Article
ISSN
0040-6090

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In 2 O 3 :Sn (ITO) films were deposited on quartz substrates by direct current magnetron sputtering and annealed in N 2 at temperatures ranging from 150 to 350 β€’ C for 1 h. The structure and morphology of the films were investigated by X-ray diffraction and atomic force microscopy. The results demon