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Growth of γ-Al2O3 thin films on silicon by low pressure metal-organic chemical vapour deposition

✍ Scribed by S.S. Yom; W.N. Kang; Y.S. Yoon; J.I. Lee; D.J. Choi; T.W. Kim; K.Y. Seo; P.H. Hur; C.Y. Kim

No coin nor oath required. For personal study only.

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