๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Multiscale Monte Carlo Simulation of Circular DC Magnetron Sputtering: Influence of Magnetron Design on Target Erosion and Film Deposition

โœ Scribed by Kwon, Ui Hui; Lee, Won Jong


Book ID
121475542
Publisher
Institute of Pure and Applied Physics
Year
2006
Tongue
English
Weight
1023 KB
Volume
45
Category
Article
ISSN
0021-4922

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Monte Carlo simulation of argon atoms tr
โœ PK Petrov; VA Volpyas; EK Hollmann; T Tanaka; K Kawabata ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 205 KB

## RFpower and DC bias have been simultaneously applied to the target in a conventional magnetron sputtering system in order to control the growth kinetics of W thin films using argon gas for sputtering. A Monte Carlo simulation based on physical models of ion-plasma sputtering was carried out to st