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MPI/MS detection of SiF and SiF2 radicals produced from the reaction of F2 and NF3 with silicon

✍ Scribed by J.A. Dagata; D.W. Squire; C.S. Dulcey; D.S.Y. Hsu; M.C. Lin

Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 469 KB
Volume: 134
Category: Article
ISSN: 0009-2614
DOI: 10.1016/0009-2614(87)87112-9

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✦ Synopsis

SiF and SiF2 radicals, produced in the thermal reaction of Fz and NF:, with solid silicon, have been detected by multiphoton ionization mass spectrometry in the 438 and 321 nm wavelength regions, respectively. The reaction pathway to the production of SiF radicals is of minor significance compared with SiF2 production over a wide range of temperatures and pressures. In both cases it was found that little or no fragmentation of the parent ion occurs upon ionization. MPYMS is thus shown to be a useful diagnostic tool for studies of fluorine-silicon etching reactions.

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