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Morphological Evolution of ZnO Thin Films Deposited by Reactive Sputtering

✍ Scribed by Mirica, Eugenia; Kowach, Glen; Evans, Paul; Du, Henry


Book ID
126832924
Publisher
American Chemical Society
Year
2004
Tongue
English
Weight
599 KB
Volume
4
Category
Article
ISSN
1528-7483

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Characterization of NiO thin films depos
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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper