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Molecular beam epitaxy growth of In0.52Al0.48As/In0.53Ga0.47As metamorphic high electron mobility transistor employing growth interruption and in situ rapid thermal annealing

โœ Scribed by Ihn, Soo-Ghang; Jo, Seong June; Song, Jong-In


Book ID
118171891
Publisher
American Institute of Physics
Year
2006
Tongue
English
Weight
664 KB
Volume
88
Category
Article
ISSN
0003-6951

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