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Modeling of the effects of substrate temperature and C2-containing plasma pressure on the structure of carbon films

✍ Scribed by V. A. Tarala, B. M. Sinel’nikov

Book ID
119882107
Publisher
SP MAIK Nauka/Interperiodica
Year
2012
Tongue
English
Weight
332 KB
Volume
48
Category
Article
ISSN
0020-1685

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Amorphous carbon nitride films (a-CN x ) were deposited on Si(100) under different rf power and at different substrate temperature T S using rf magnetron sputtering of a high-purity graphite target in pure nitrogen. IR absorption, Raman spectra, and residual stress measurements are used to character