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Modeling of Precursors for Atomic Layer Deposition of Magnesium and Calcium Oxide

✍ Scribed by Kazadojev, Ivan; Otway, David J.; Elliott, Simon D.


Book ID
126853804
Publisher
John Wiley and Sons
Year
2013
Tongue
English
Weight
533 KB
Volume
19
Category
Article
ISSN
0948-1907

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Atomic Layer Deposition of Hafnium and Z
✍ Hausmann, Dennis M.; Kim, Esther; Becker, Jill; Gordon, Roy G. πŸ“‚ Article πŸ“… 2002 πŸ› American Chemical Society 🌐 English βš– 248 KB

Atomic layer deposition (ALD) of smooth and highly conformal films of hafnium and zirconium oxides was studied using six metal alkylamide precursors for hafnium and zirconium. Water was used as an oxygen source during these experiments. As deposited, these films exhibited a smooth surface with a mea