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Atomic layer deposition of ytterbium oxide using -diketonate and ozone precursors

✍ Scribed by M. Bosund; K. Mizohata; T. Hakkarainen; M. Putkonen; M. Söderlund; S. Honkanen; H. Lipsanen

Book ID
108064137
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
351 KB
Volume
256
Category
Article
ISSN
0169-4332

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✍ Hausmann, Dennis M.; Kim, Esther; Becker, Jill; Gordon, Roy G. 📂 Article 📅 2002 🏛 American Chemical Society 🌐 English ⚖ 248 KB

Atomic layer deposition (ALD) of smooth and highly conformal films of hafnium and zirconium oxides was studied using six metal alkylamide precursors for hafnium and zirconium. Water was used as an oxygen source during these experiments. As deposited, these films exhibited a smooth surface with a mea