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Modeling of electron beam scattering in high resolution lithography for the fabrication of X-Ray masks

✍ Scribed by Gentili, M. ;Lucchesini, A. ;Scopa, L. ;Lugli, P. ;Paoletti, A. ;Messina, G. ;Santangelo, S. ;Tucciarone, A.

No coin nor oath required. For personal study only.

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