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High precision mask fabrication for deep X-ray lithography using 40-kV shaped electron beam lithography

✍ Scribed by Andreas Schmidt; Gerhard Himmelsbach; Regina Lüttge; Dieter Adam; Falk Hoke; Hartmut Schacke; Nicola Belic; Hans Hartmann; Frank Burkhard; Hermann Wolf

Book ID: 114155287
Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 860 KB
Volume: 57-58
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(01)00479-8

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