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Stability of SiC-masks for high resolution synchrotron X-ray lithography

✍ Scribed by H. Lüthje; U. Mackens; U. Mescheder; B. Mathhieβen


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
42 KB
Volume
5
Category
Article
ISSN
0167-9317

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