Fabrication by tri-level electron beam lithography of X-ray masks with 50nm linewidths, and replication by X-ray nanolithography

✍ Scribed by Erik H. Anderson; D.P. Kern; Henry I. Smith

• Publisher: Elsevier Science
• Year: 1987
• Tongue: English
• Weight: 488 KB
• Volume: 6
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(87)90085-2