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MOCVD of Aluminum Nitride Thin Films with a New Type of Single-Source Precursor: AlCl3:tBuNH2.

✍ Scribed by Oh-Shim Joo; Kwang-Deog Jung; Sung-Hoon Cho; Je-Hong Kyoung; Chang-Kyu Ahn; Seung-Chul Choi; Yongkwan Dong; Hoseop Yun; Sung-Hwan Han

Publisher: John Wiley and Sons
Year: 2003
Weight: 69 KB
Volume: 34
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.200309021

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