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Microstructure of Ti thin films formed by energetic physical vapour deposition processes

✍ Scribed by D. Manova; D. Hirsch; S. Mändl; H. Neumann

Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
543 KB
Volume
267
Category
Article
ISSN
0168-583X

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## Abstract Ti‐doped In~2~O~3~ (ITiO) thin films have been prepared by electron beam physical vapour deposition (EB‐PVD). Their optical and electrical properties are studied for the obtained compositions. After oxygen annealing all samples show excellent optical transparence; additionally, maximum