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Microstructural characterization of thin SiOx films obtained by physical vapor deposition

✍ Scribed by M.A. Curiel; N. Nedev; D. Nesheva; J. Soares; R. Haasch; M. Sardela; B. Valdez; B. Sankaran; E. Manolov; I. Bineva; I. Petrov


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
652 KB
Volume
174
Category
Article
ISSN
0921-5107

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