๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Microstructure characterization of microcrystalline silicon thin films deposited by very high frequency plasma-enhanced chemical vapor deposition by spectroscopic ellipsometry

โœ Scribed by He Zhang; Xiaodan Zhang; Changchun Wei; Jian Sun; Xinhua Geng; Shaozhen Xiong; Ying Zhao

Book ID
113937003
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
805 KB
Volume
520
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Wet etching studies of silicon nitride t
Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition
โœ K.B. Sundaram; R.E. Sah; H. Baumann; K. Balachandran; R.M. Todi ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 194 KB

Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p