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Metal—organic chemical vapor deposition of copper using hydrated copper formate as a new precursor

✍ Scribed by Marie-José Mouche; Jean-Luc Mermet; Maurice Romand; Marlène Charbonnier


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
603 KB
Volume
262
Category
Article
ISSN
0040-6090

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