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Metal-organic chemical vapor deposition of tantalum nitride barrier layers for ULSI applications

✍ Scribed by M.H. Tsai; S.C. Sun; C.P. Lee; H.T. Chiu; C.E. Tsai; S.H. Chuang; S.C. Wu

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 762 KB
Volume: 270
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(95)06752-3

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## Abstract Lanthanum nickelate layers have been deposited onto 100 mm diameter silicon/silicon dioxide and (0001) sapphire substrates by liquid‐delivery metal–organic (MO) CVD using the precursors La(thd)~3~ and Ni(thd)~2~ (thd = 2,2,6,6‐tetramethyl‐3,5‐heptanedionato) dissolved in tetrahydrofuran