Low temperature metal-organic chemical vapor deposition of aluminum nitride with nitrogen trifluoride as the nitrogen source

✍ Scribed by J.H. Edgar; Z.J. Yu; A.U. Ahmed; A. Rys

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 282 KB
• Volume: 189
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(90)90469-t