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Metal-Organic Chemical Vapor Deposition of Ferroelectric SrBi 2 Ta 2 O 9 Films from a Fluorine-Containing Precursor System

✍ Scribed by Condorelli, G. G.; Favazza, M.; Bedoya, C.; Baeri, A.; Anastasi, G.; Lo Nigro, R.; Menou, N.; Muller, C.; Lisoni, J. G.; Wouters, D.; Fragalà, I. L.

Book ID: 127368329
Publisher: American Chemical Society
Year: 2006
Tongue: English
Weight: 435 KB
Volume: 18
Category: Article
ISSN: 0897-4756
DOI: 10.1021/cm051151+

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