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Mechanism of dopant segregation to SiO[sub 2]/Si(001) interfaces

✍ Scribed by Dabrowski, J.; Casali, R. A.; Müssig, H.-J.; Baierle, R.; Caldas, M. J.; Zavodinsky, V.

Book ID: 121739579
Publisher: AVS (American Vacuum Society)
Year: 2000
Tongue: English
Weight: 638 KB
Volume: 18
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.1306310

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