𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms

✍ Scribed by Nikolajeff, Fredrik ;Bengtsson, Jörgen ;Larsson, Michael ;Ekberg, Mats ;Hård, Sverker


Book ID
115343953
Publisher
The Optical Society
Year
1995
Tongue
English
Weight
170 KB
Volume
34
Category
Article
ISSN
1559-128X

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Cellector: A new software tool for the s
✍ H. Hartmann; R. Steinmetz; T. Waas; P. Hahmann; Ch. Ehrlich 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 690 KB

## Ab~ra~ A new software tool for the support of cell projection in combination with variable shape electron beam lithography for mask making and direct write application is described. The program has been designed and developed for the WePrint 200, a new variable shape electron beam lithography s