✦ LIBER ✦

Measurement of residual stress of PZT thin film on Si(1 0 0) by synchrotron X-ray rocking curve technique

✍ Scribed by Y.H. Yu; M.O. Lai; L. Lu; P. Yang

Book ID: 116600483
Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 289 KB
Volume: 449
Category: Article
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2006.02.109

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

In situ combined synchrotron X-ray diffr

In situ combined synchrotron X-ray diffraction and wafer curvature measurements during formation of thin palladium silicide film on Si(0 0 1) and Si (1 1 1)

✍ J. Fouet; M.-I. Richard; C. Mocuta; C. Guichet; O. Thomas 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 381 KB

High-resolution X-ray diffraction studie

High-resolution X-ray diffraction studies of combinatorial epitaxial Ge (0 0 1) thin-films on Ge (0 0 1) substrates

✍ Yuncheng Zhong; Yong S. Chu; Brian A. Collins; Frank Tsui 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 308 KB

Growth of 3C–SiC(1 0 0) thin f

Growth of 3C–SiC(1 0 0) thin films on Si(1 0 0) by the molecular ion beam deposition

✍ Takashi Matsumoto; Masato Kiuchi; Satoshi Sugimoto; Seiichi Goto 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 685 KB

Measurement of residual-stress effect by

Measurement of residual-stress effect by nanoindentation on elastically strained (1 0 0) W

✍ Yun-Hee Lee; Dongil Kwon 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 233 KB

The influence of thermal annealing on re

The influence of thermal annealing on residual stresses and mechanical properties of arc-evaporated TiCxN1−x (x=0,  0.15  and  0.45) thin films

✍ L. Karlsson; A. Hörling; M.P. Johansson; L. Hultman; G. Ramanath 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 336 KB

We report the stress relaxation behavior of arc-evaporated TiC x N 1Ϫx thin films during isothermal annealing between 350 and 900°C. Films with x ϭ 0, 0.15, and 0.45, each having an initial compressive intrinsic stress s int ϭ Ϫ 5.4GPa, were deposited by varying the substrate bias V s and the gas co

X-ray multiple diffraction in the charac

X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(0 0 1)

✍ Th. Chiaramonte; E. Abramof; F. Fabreguette; M. Sacilotti; L.P. Cardoso 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 320 KB

Measurement of residual stress of PZT thin film on Si(1&#xa0;0&#xa0;0) by synchrotron X-ray rocking curve technique

Measurement of residual stress of PZT thin film on Si(1 0 0) by synchrotron X-ray rocking curve technique