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Measured In-plane hole drift and hall mobility in heavily-doped strained p-type Si1−xGex

✍ Scribed by J. M. McGregor; T. Manku; J. -P. Noël; D. J. Roulston; A. Nathan; D. C. Houghton


Book ID
112817796
Publisher
Springer US
Year
1993
Tongue
English
Weight
236 KB
Volume
22
Category
Article
ISSN
0361-5235

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We present a systematic theoretical study of the low-temperature (T = 0 K) quasi-twodimensional-hole gas mobility in strained p-Si/Si 0.8 Ge 0.2 /p-Si selectively doped double heterojunctions. Ionized-impurity (remote and background), interface-roughness and alloyscattering mechanisms are taken into