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Hole mobility measurements in heavily doped Si1-xGex strained layers

โœ Scribed by Carns, T.K.; Chun, S.K.; Tanner, M.O.; Wang, K.L.; Kamins, T.I.; Turner, J.E.; Lie, D.Y.C.; Nicolet, M.-A.; Wilson, R.G.


Book ID
114535772
Publisher
IEEE
Year
1994
Tongue
English
Weight
1022 KB
Volume
41
Category
Article
ISSN
0018-9383

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We present a systematic theoretical study of the low-temperature (T = 0 K) quasi-twodimensional-hole gas mobility in strained p-Si/Si 0.8 Ge 0.2 /p-Si selectively doped double heterojunctions. Ionized-impurity (remote and background), interface-roughness and alloyscattering mechanisms are taken into