Magnetron sputtering deposition Ti–B–C–N films by Ti/B4C compound target

✍ Scribed by Guangze Tang; Xinxin Ma; Mingren Sun; Shuyan Xu

• Book ID: 104094457
• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 706 KB
• Volume: 203
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2008.10.038

✦ Synopsis

Ti-B-C-N films were deposited by unbalanced DC magnetron sputtering with Ti/B 4 C compound target. The sputtering zone in the surface of the target was adjusted by a magnetic coil. X-ray photoelectron spectrum, X-ray diffraction, nano-indentation and scratch tests were used to analyze the film composition, phase structure, hardness, modulus and scratch resistance. The results showed that the composition of the Ti-B-C-N films can be adjusted by changing deposition parameters, such as gas ratio of N 2 to Ar and the magnetron coil current. The main crystal phase in the films was TiB 2 . The proportion of crystalline TiB 2 decreased with the increasing of N 2 partial pressure and reached a maximum value at 300 mA magnetic coil current, when the coil current changed from 200 mA to 500 mA. The films containing more TiB 2 proportion showed higher hardness and modulus. The scratch resistance of the films increased with the films hardness.