Magnetron sputtering deposition Ti–B–C–N
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Guangze Tang; Xinxin Ma; Mingren Sun; Shuyan Xu
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Article
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2009
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Elsevier Science
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English
⚖ 706 KB
Ti-B-C-N films were deposited by unbalanced DC magnetron sputtering with Ti/B 4 C compound target. The sputtering zone in the surface of the target was adjusted by a magnetic coil. X-ray photoelectron spectrum, X-ray diffraction, nano-indentation and scratch tests were used to analyze the film compo