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Relation of deposition conditions of Ti-N films prepared by d.c. magnetron sputtering to their microstructure and macrostress

✍ Scribed by J. Musil; V. Poulek; V. Valvoda; R. Kužel Jr.; H.A. Jehn; M.E. Baumgärtner

Book ID
107930271
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
524 KB
Volume
60
Category
Article
ISSN
0257-8972

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