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Magnetic field strength influence on the reactive magnetron sputter deposition of Ta 2 O 5

✍ Scribed by Hollerweger, R; Holec, D; Paulitsch, J; Rachbauer, R; Polcik, P; Mayrhofer, P H

Book ID
121447325
Publisher
Institute of Physics
Year
2013
Tongue
English
Weight
739 KB
Volume
46
Category
Article
ISSN
0022-3727

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## Abstract A conventional 2 inch planar, circular magnetron has been designed allowing an __in situ__ variation of the magnetic field configuration, i.e. the distance of the peripheral magnet ring and central magnet cylinder to the target could be varied independently from each other. The developm