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Influence of the substrate bias voltage on the physical properties of dc reactive sputtered Ta2O5 films

โœ Scribed by K. Cang; L.Y. Liang; Z.M. Liu; L. Wu; H. Luo; H.T. Cao; Y.S. Zou

Book ID
118461608
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
915 KB
Volume
550
Category
Article
ISSN
0925-8388

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## Abstract Cuprous oxide (Cu~2~O) films were formed by dc reactive magnetron sputtering onto glass substrates held at various temperatures in the range 303โ€“648 K. The substrate temperature was found to be an important parameter in controlling the physical properties of the deposited films. The var