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Effect of substrate bias voltage on the physical properties of dc reactive magnetron sputtered NiO thin films

โœ Scribed by A. Mallikarjuna Reddy; A. Sivasankar Reddy; P. Sreedhara Reddy

Book ID
113783971
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
626 KB
Volume
125
Category
Article
ISSN
0254-0584

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## Abstract Cuprous oxide (Cu~2~O) films were formed by dc reactive magnetron sputtering onto glass substrates held at various temperatures in the range 303โ€“648 K. The substrate temperature was found to be an important parameter in controlling the physical properties of the deposited films. The var