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Effect of substrate temperature on the physical properties of dc magnetron sputtered CuAlO2 films

โœ Scribed by A. Sivasankar Reddy; Hyung-Ho Park; G. Mohan Rao; S. Uthanna; P. Sreedhara Reddy

Book ID
116603840
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
657 KB
Volume
474
Category
Article
ISSN
0925-8388

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## Abstract Cuprous oxide (Cu~2~O) films were formed by dc reactive magnetron sputtering onto glass substrates held at various temperatures in the range 303โ€“648 K. The substrate temperature was found to be an important parameter in controlling the physical properties of the deposited films. The var

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